Sputtering Targets
High-purity PGM & minor metal sputtering targets for physical vapor deposition
Custom Sputtering Targets Manufacturing & Supply
Fortis Metals specializes in manufacturing high-purity sputtering targets for physical vapor deposition (PVD) thin film coating processes. Our sputtering targets are engineered for semiconductor fabrication, optical coatings, solar cells, LED manufacturing, and MEMS devices. We supply rotary sputtering targets, planar targets, and custom-shaped targets with precise tolerances.
We manufacture custom sputtering targets for all major PVD equipment manufacturers including Evatec sputtering systems, Applied Materials Endura, SPTS Technologies, Ulvac sputtering tools, and AJA sputter coaters. Our sputtering target materials include precious metal targets, refractory metal targets, and advanced ceramic targets meeting industry thin film deposition standards.
Sputtering Target Applications & Industries
Magnetic Storage & Memory Devices
Hard drives, MRAM, advanced data storage
Ruthenium and Iridium are critical for next-generation magnetic storage, offering superior properties for seed layers, barrier layers, and electrodes.
Ru | Ir | Ta | Hf | W | Ti
Advanced Semiconductor Devices
Gate electrodes, barriers, interconnects
Minor metals like Hafnium and Tantalum enable cutting-edge semiconductor fabrication, while Ruthenium and Iridium provide exceptional reliability.
Ru | Ir | Hf | Ta | W | Nb
Electrochemical & Energy Applications
Fuel cells, electrolyzers, capacitors
Iridium and Ruthenium excel in harsh electrochemical environments, critical for green hydrogen production and energy storage systems.
Ir | Ru | Ta | Nb | Ti
Optical & Display Technologies
ITO coatings, transparent conductors
Minor metals including Indium, Gallium, and Germanium enable transparent conductive films for displays, touch screens, and photovoltaics.
In | Ga | Ge | Bi | Te
High-Temperature & Aerospace
Protective coatings, superalloys
Iridium and minor refractory metals provide extreme temperature resistance for aerospace, nuclear, and industrial applications.
Ir | Ru | Hf | Nb | W
MEMS, Sensors & Passives
Microsystems, resistors, inductors
Tantalum, Niobium, and other minor metals deliver precise electrical properties for miniaturized sensors and passive components.
Ru | Ta | Nb | Hf | W | Ti
High Purity Sputtering Materials
99.9% to 99.999% pure PGM and minor metal sputtering targets with certified material compositions and purity certificates for semiconductor and thin film applications.
Custom Sputtering Target Fabrication
Precision-machined sputtering targets in any size or shape. Planar targets, rotary targets, cylindrical targets machined to exact specifications for your PVD system.
Fast Sputtering Target Delivery
Quick turnaround for production and R&D sputtering targets with full quality documentation, material certificates, and for technical guidance.
Technical Resources & Material Guides
Explore our comprehensive technical guides and specifications for PGM sputtering targets
Order Custom Sputtering Targets - Request a Quote
Contact Fortis Metals for high-purity PGM and minor metal sputtering targets. Custom sizes, bonding services, and fast delivery for all PVD applications.
Request Sputtering Target Quote